EFFECT OF COMPOSITION ON RESIST DRY-ETCHING SUSCEPTIBILITY: VINLY POLYMERS AND PHOTORESISTSHELBERT JN; SCHMIDT MA.1982; ACS SYMPOSIUM SERIES; ISSN 0097-6156; USA; DA. 1982; VOL. 184; PP. 61-72; BIBL. 10 REF.Conference Paper

SCALAR DYNAMIC NUCLEAR POLARIZATION OF PROTONS IN TRIFLUOROACETIC ACID SOLUTIONS.HELBERT JN; POINDEXTER EH; WAGNER BE et al.1977; CHEM. PHYS. LETTERS; NETHERL.; DA. 1977; VOL. 52; NO 3; PP. 546-548; BIBL. 11 REF.Article

POLY(METHYL ALPHA -CHLORACRYLATE) AS A NEW POSITIVE ELECTRON-BEAM RESIST.HELBERT JN; COOK CF JR; POINDEXTER EH et al.1977; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1977; VOL. 124; NO 1; PP. 158-159; BIBL. 6 REF.Article

PARAMAGNETIC DEFECTS IN SILICON/SILICON DIOXIDE SYSTEMS.CAPLAN PJ; HELBERT JN; WAGNER BE et al.1976; SURF. SCI.; NETHERL.; DA. 1976; VOL. 54; NO 1; PP. 33-42; BIBL. 22 REF.Article

MATRIX ENDOR OF POLYENYL RADICALS IN POLYMERSHELBERT JN; WAGNER BE; POINDEXTER EH et al.1975; J. POLYM. SCI., POLYM. PHYS. ED.; U.S.A.; DA. 1975; VOL. 13; NO 4; PP. 825-834; BIBL. 18 REF.Article

RADIATION DEGRADATION OF ALPHA -SUBSTITUTED ACRYLATE POLYMERS AND COPOLYMERS.HELBERT JN; CAPLAN PJ; POINDEXTER EH et al.1977; J. APPL. POLYM. SCI.; U.S.A.; DA. 1977; VOL. 21; NO 3; PP. 797-807; BIBL. 19 REF.Article

PARAMAGNETIC DEFECTS IN SILICON/SILICON DIOXIDE SYSTEMS.CAPLAN PJ; HELBERT JN; WAGNER BE et al.1976; SURF. SCI.; NETHERL.; DA. 1976; VOL. 54; NO 1; PP. 33-42; BIBL. 22 REF.Article

INCREASED RADIATION DEGRADATION IN METHYL METHACRYLATE POLYMERSHELBERT JN; WAGNER BE; CAPLAN PJ et al.1975; J. APPL. POLYM. SCI.; U.S.A.; DA. 1975; VOL. 19; NO 4; PP. 1201-1203; BIBL. 11 REF.Article

COMPLEXING AND PROTONATION OF FREE-RADICAL IMIDAZOLIN-L-OXYL AND IMIDAZOLIN-L-OXYL 3-OXIDE LIGANDS: A MAGNETIC-RESONANCE INVESTIGATIONS.HELBERT JN; KOPF PW; POINDEXTER EH et al.1975; J. CHEM. SOC., DALTON TRANS.; G.B.; DA. 1975; NO 11; PP. 998-1006; BIBL. 36 REF.Article

GAMMA-RAY DEGRADATION OF 1,1-DISUBSTITUTED VINYL COPOLYMERS.CHI YU CHEN; MOHAMMAD IGBAL; PITTMAN CU JR et al.1978; MAKROMOLEK. CHEM.; CHE; DA. 1978; VOL. 179; NO 8; PP. 2109-2115; BIBL. 11 REF.Article

EFFECT OF CHEMICAL COMPOSITION UPON THE RADIATION AND ELECTRON BEAM RESIST BEHAVIORS OF VINYL POLYMERSHELBERT JN; IAFRATE GJ; PITTMAN CU JR et al.1980; POLYM. ENG. SCI.; ISSN 0032-3888; USA; DA. 1980; VOL. 20; NO 16; PP. 1077-1081; BIBL. 20 REF.Article

RADIATION DEGRADATION OF METHYL ALPHA -CHLOROACRYLATE-METHACRYLONITRILE COPOLYMERSCHI YU CHEN; PITTMAN CU JR; HELBERT JN et al.1980; J. POLYM. SCI., POLYM. CHEM. ED.; USA; DA. 1980; VOL. 18; NO 1; PP. 169-178; BIBL. 18 REF.Article

CHARACTERIZATION OF SILICA SURFACES BY FREE RADICAL SPIN LABELS.WAGNER BE; HELBERT JN; POINDEXTER EH et al.1977; SURF. SCI.; NETHERL.; DA. 1977; VOL. 67; NO 1; PP. 251-268; BIBL. 27 REF.Article

DIFFERENTIAL DISSOLUTION AND ELECTRON-BEAM LITHOGRAPHIC SENSITIVITY OF POLY(METHYL) METHACRYLATE.HELBERT JN; COOK CF JR; POINDEXTER EH et al.1977; POLYM. ENGNG SCI.; U.S.A.; DA. 1977; VOL. 17; NO 6; PP. 414-419; BIBL. 13 REF.; (PHOTOPOLYM. CONF. 4; ELLENVILLE, N.Y.; 1976)Conference Paper

INTRALEVEL HYBRID RESIST PROCESS FOR THE FABRICATION OF METAL OXIDE SEMICONDUCTOR DEVICES WITH SUBMICRON GATE LENGTHSHELBERT JN; SEESE PA; GONZALES AJ et al.1983; OPTICAL ENGINEERING; ISSN 0091-3286; USA; DA. 1983; VOL. 22; NO 2; PP. 185-189; BIBL. 6 REF.Article

RADIATION DEGRADATION BEHAVIOR OF CHLORINE-CONTAINING VINYL COPOLYMERS. SEARCH FOR IMPROVED ELECTRON-BEAM RESISTSHELBERT JN; POINDEXTER EH; PITTMAN CU JR et al.1980; POLYM. ENG. SCI.; ISSN 0032-3888; USA; DA. 1980; VOL. 20; NO 9; PP. 630-636; BIBL. 17 REF.Article

RADIATION DEGRADATION OF POLY (A-HYDROXYISOBUTYRIC ACID) AND POLY (GLYCOLLIC ESTER)PITTMAN CU JR; IQBAL M; CHEN CY et al.1978; J. POLYM. SCI., POLYM. CHEM. ED.; USA; DA. 1978; VOL. 16; NO 10; PP. 2721-2724; BIBL. 12 REF.Article

RADIATION DEGRADATION STUDY OF POLY(METHYL-ALPHA CHLOROACRYLATE) AND THE METHYL METHACRYLATE COPOLYMERHELBERT JN; CHI YU CHEN; PITTMAN CU JR et al.1978; MACROMOLECULES; USA; DA. 1978; VOL. 11; NO 6; PP. 1104-1109; BIBL. 33 REF.Article

ELECTRON BEAM AND X-RAY RESIST BEHAVIOR OF POLY (METHACRYLONITRILEHELBERT JN; COOK CF JR; CHI YU CHEN et al.1979; J. ELECTROCHEM. SOC.; USA; DA. 1979; VOL. 126; NO 4; PP. 694-696; BIBL. 13 REF.Article

RADIATION DEGRADATION SUSCEPTIBILITY OF VINYL POLYMERS: NITRILES AND ANHYDRIDESHELBERT JN; POINDEXTER EH; STAHL GA et al.1979; J. POLYM. SCI., POLYM. CHEM. ED.; USA; DA. 1979; VOL. 17; NO 1; PP. 49-58; BIBL. 14 REF.Article

SYNTHESIS, RADIATION DEGRADATION, AND ELECTRON BEAM RESIST BEHAVIOR OF FLUORINE-CONTAINING VINYL POLYMERSPITTMAN CV JR; UEDA M; CHEN CY et al.1981; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1981; VOL. 128; NO 8; PP. 1758-1762; BIBL. 16 REF.Article

SYNTHESIS AND RADIATION DEGRADATION OF VINYL POLYMERS WITH FLUORINE: SEARCH FOR IMPROVED LITHOGRAPHIC RESISTSPITTMAN CU JR; CHI YU CHEN; UEDA M et al.1980; J. POLYM. SCI., POLYM. CHEM. ED.; ISSN 0360-6376; USA; DA. 1980; VOL. 18; NO 12; PP. 3413-3425; BIBL. 24 REF.Article

DYNAMIC NUCLEAR POLARIZATION STUDIES OF LABILE COMPLEX FORMATION BETWEEN LITHIUM ION AND NITRONYL NITROXIDE OR IMIDAZOLINE-1-OXYL RADICAL LIGANDS.WAGNER BE; LINOWSKI JW; POTENZA JA et al.1976; J. AMER. CHEM. SOC.; U.S.A.; DA. 1976; VOL. 98; NO 15; PP. 4405-4409; BIBL. 23 REF.Article